Benefiting from the gradual increase in the penetration rate of the downstream LED lighting market, the orders for graphical sapphire substrates (PSS) are bursting. At present, Taiwan's PSS manufacturers, Ruijie and Zhaoyuan, are near full capacity and are preparing to expand production capacity.
The PSS technique is to grow a mask for dry etching on a sapphire substrate, pattern the mask with a standard photolithography process, etch sapphire by ICP etching, remove the mask, and grow GaN thereon. The material changes the longitudinal extension of the GaN material to lateral extension. This technology and the general sapphire substrate can increase the brightness of the LED by about 30-50%, while reducing the reverse leakage current and effectively extending the life of the LED.
With the advancement of technology, the cost of LED lighting is gradually reduced, and the penetration rate is expected to move from a slow increase to a rapid increase phase, driving the demand of industries such as upstream PSS.
The PSS technique is to grow a mask for dry etching on a sapphire substrate, pattern the mask with a standard photolithography process, etch sapphire by ICP etching, remove the mask, and grow GaN thereon. The material changes the longitudinal extension of the GaN material to lateral extension. This technology and the general sapphire substrate can increase the brightness of the LED by about 30-50%, while reducing the reverse leakage current and effectively extending the life of the LED.
With the advancement of technology, the cost of LED lighting is gradually reduced, and the penetration rate is expected to move from a slow increase to a rapid increase phase, driving the demand of industries such as upstream PSS.
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